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検索キーワード:(著者名に左の語を含む: #Vossen John L.)
該当件数:10件
Contemporary preparative techniques / edited by Maurice H. Francombe, John L. Vossen
Boston : Academic Pr. , c1989. - Tokyo. - (Physics of thin films : advances in research and development / edited by Georg Hass ; v. 14)
図書
Thin films for advanced electronic devices / edited by Maurice H. Francombe, John L. Vossen
Boston : Academic Pr. , c1991. - San Diego. - (Physics of thin films : advances in research and development ; v. 15)
Mechanic and dielectric properties / edited by Maurice H. Francombe, John L. Vossen
Boston : Academic Pr. , c1993. - San Diego. - (Physics of thin films : advances in research and development ; v. 17)
Plasma sources for thin film deposition and etching / edited by Maurice H. Francombe, John L. Vossen
San Diego : Academic Pr. , c1994. - Tokyo. - (Physics of thin films : advances in research and development ; v. 18)
Thin films for emerging applications / edited by Maurice H. Francombe and John L. Vossen
Boston : Academic Pr. , c1992. - San Diego. - (Physics of thin films : advances in research and development ; v. 16)
Homojunction and quantum-well infrared detectors / volume editors, Maurice H. Francombe and John L. Vossen
San Diego : Academic Pr. , c1995. - Tokyo. - (Thin films ; v. 21)
Advances in research and development : heterojunctions for high-speed and infrared applications / volume editors, Maurice H. Francombe, John L. Vossen
San Diego : Academic Pr. , c1998. - (Thin films ; v. 23)
Modeling of film deposition for microelectronic applications / edited by Stephen Rossnagel
San Diego : Academic Pr. , c1996. - Tokyo. - (Thin films ; v. 22)
Thin film processes / edited by John L. Vossen, Werner Kern
[v. 1],v. 2. - New York : Academic Press , c1978-c1991
Physics of thin films : advances in research and development
v. 1 (1963) - v. 13 (1987). - New York : Academic Press , 1963-